Atomic Layer Epitaxy

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• Atomic layer epitaxy — (ALE), now more generally called Atomic Layer Deposition, is a specialized form of epitaxy that typically deposit alternating monolayers of two elements onto a substrate. The crystal lattice structure achieved is thin, uniform, and aligned with… …   Wikipedia

• Atomic layer deposition — (ALD) is a gas phase chemical process used to create extremely thin coatings. The majority of ALD reactions use two chemicals, typically called s. These precursors react with a surface one at a time in a sequential manner. By exposing the… …   Wikipedia

• Atomic Layer Deposition — Die Atomlagenabscheidung (engl. atomic layer deposition, ALD) ist ein stark verändertes CVD Verfahren zur Abscheidung von dünnen Schichten. Verschiedene Namen ein Prinzip, die Atomlagenabscheidung[1] Bezeichnung Abkürzung Atomic layer deposition… …   Deutsch Wikipedia

• Epitaxy — refers to the method of depositing a monocrystalline film on a monocrystalline substrate. The deposited film is denoted as epitaxial film or epitaxial layer. The term epitaxy comes from a Greek root ( epi above and taxis in ordered manner ) which …   Wikipedia

• epitaxy — /ep i tak see/, n., pl. epitaxies. Crystall. epitaxis. * * * ▪ crystallography       the process of growing a crystal of a particular orientation on top of another crystal, where the orientation is determined by the underlying crystal. The… …   Universalium

• Metalorganic vapour phase epitaxy — (MOVPE), also known as organometallic vapour phase epitaxy (OMVPE) or metalorganic chemical vapour deposition (MOCVD), is a chemical vapour deposition method of epitaxial growth of materials, especially compound semiconductors from the surface… …   Wikipedia

• Chemical beam epitaxy — (CBE) forms an important class of deposition techniques for semiconductor layer systems, especially III V semiconductor systems. This form of epitaxial growth is performed in an ultrahigh vacuum system. The reactants are in the form of molecular… …   Wikipedia

• Wetting layer — In experimental physics, a wetting layer is a initial layer of atoms that is epitaxially grown on a surface upon which self assembled quantum dots or thin films are created. The atoms composing a wetting layer can be semimetallic… …   Wikipedia

• Atomlagenabscheidung — Die Atomlagenabscheidung (englisch atomic layer deposition, ALD) ist ein stark verändertes CVD Verfahren zur Abscheidung von dünnen Schichten. Diese haben in der Regel eine polykristalline oder amorphe Struktur. Für einkristalline… …   Deutsch Wikipedia

• осаждение атомных слоев — Термин осаждение атомных слоев Термин на английском atomic layer deposition Синонимы атомно слоевое осаждение, молекулярное наслаивание, atomic layer epitaxy Аббревиатуры ALD, ALE Связанные термины нанослой Определение технология нанесения тонких …   Энциклопедический словарь нанотехнологий

• Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in …   Wikipedia